Magnetron Sputtering Technique Research Articles

Hemocompatibility and Preangiogenic Attributes of SiBxCyNzOm Coatings for Biomedical Applications.

In current clinical practices related to orthopedics, dental, and cardiovascular surgeries, a number of biomaterial coatings, such as hydroxyapatite (HAp), diamond-like carbon (DLC), have been used in combination with metallic substrates (stainless steel, Ti6Al4V alloy, etc.). Although SiBCN coatings are widely explored in material science for diverse applications, their potential remains largely unexplored for biomedical applications. With this motivation, the present work reports the development of SiBxCyNzOm coatings on a Ti6Al4V substrate, employing a reactive radiofrequency (RF) magnetron sputtering technique. Three different coating compositions (Si0.27B0.10C0.31N0.07O0.24, Si0.23B0.06C0.21N0.22O0.27, and Si0.20B0.05C0.19N0.20O0.35) were obtained using a Si2BC2N target and varying nitrogen flow rates. The hydrophilic properties of the as-synthesized coatings were rationalized in terms of an increase in the number of oxygen-containing functional groups (OH and NO) on the surface, as probed using XPS and FTIR analyses. Furthermore, the cellular monoculture of SVEC4-10 endothelial cells and L929 fibroblasts established good cytocompatibility. More importantly, the coculture system of SVEC4-10 and L929, in the absence of growth factors, demonstrated clear cellular phenotypical changes, with extensive sprouting leading to tube-like morphologies on the coating surfaces, when stimulated using a customized cell stimulator (StimuCell) with 1.15 V/cm direct current (DC) electric field strength for 1 h. In addition, the hemocompatibility assessment using human blood samples revealed clinically acceptable hemolysis, less erythrocyte adhesion, shorter plasma recalcification, and reduced risk for thrombosis on the SiBxCyNzOm coatings, when compared to uncoated Ti6Al4V. Taken together, the present study unambiguously establishes excellent cytocompatibility, hemocompatibility, and defines the preangiogenic properties of SiBxCyNzOm bioceramic coatings for potential biomedical applications.

2D analysis of sputtered species transport in high-power impulse magnetron sputtering (HiPIMS) discharge

Among the numerous advantages of the high-power impulse magnetron sputtering (HiPIMS) technique, the most important is the enhanced ionization degree of sputtered species contributing to the film growth. Consequently, the quality of deposited thin films is highly improved. Still, the optimization process is challenging due to the complexity associated with the intricate transport of the sputtered species, ionized or neutrals. The scarce knowledge available on the spatial distribution of these species when operating a HiPIMS discharge makes the quantitative prediction of any deposition feature particularly difficult. In this paper, we discuss the influence of experimentally controllable quantities, such as gas pressure and target current density, on the transport of sputtered titanium in non-reactive (argon) HiPIMS, namely, on the behavior of metal atoms and metal ion fluxes intercepting the substrate. Systematic quantitative measurements were performed in a diameter normal plane on a circular planar target. Hence, the 2D spatial distribution of the ionized flux fraction (IFF) and the total flux of titanium sputtered particles (deposition rate) are evaluated by biasing a quartz crystal microbalance equipped with an electron magnetic filter. The wide range of parameters we examined allows us to predict and optimize the flux of sputtered species based on complete mapping of the IFF of sputtered particles.

Shaping of thermal protective properties of basalt fabric-based composites by direct surface modification using magnetron sputtering technique

Abstract A direct modification of the surface of the basalt fabric was carried out by using magnetron sputtering to obtain composites intended for effective protection against contact and radiant heat. One-layer composite with a coating of aluminum (Al) and zirconium dioxide (ZrO2), two-layer composite with a coating of Al/ZrO2, and two-layer composite with a coating of Al/(ZrO2 + titanium dioxide [TiO2]) were deposited on the fabric surface. Scanning electron microscopy with energy-dispersive X-ray spectroscopy analysis was used to assess the coating on basalt fabrics and determine their chemical composition. Parameters such as thermal conductivity coefficient, resistance to radiant heat, and resistance to contact heat for a contact temperature of 250°C were determined for assessment of the composites from the point of view of protective properties. The similarity analysis of composites was performed to state the impact of coating components’ content and coating thickness on chosen parameters. It was found that a two-layer composite in which the outer layer is Al and the inner layer is a mixture of ZrO2 and TiO2 provides good thermal insulation properties. The composites capable of protecting against contact heat at the first efficiency level and against radiant heat at the second efficiency level were obtained.

Developing energy-efficient nitrate-to-ammonia flow cells with bifunctional NiFeW-oxide thin-film electrodes made by magnetron sputtering technique

Herein, we develop a sputtered NiFeW-oxide thin-film bifunctional electrocatalyst with the incorporated oxygen vacancies and multivalent cations of Ni2+/3+, Fe2+/3+, and W6+ to enhance the economic viability of electrocatalytic nitrate reduction for commercial applications. Our NFW-0.5 achieves a notable 54.6 mg/h.cm2 ammonia yield rate at a modest applied potential of −0.2 V vs. RHE, coupled with an outstanding Faradaic efficiency of 93.7%. Furthermore, our NFW-0.5(+)‖NFW-0.5(−) flow-cell electrolyzer with a larger electrode of 2×2 cm2 reveals an impressive ammonia productivity of 143.5 mg/h.cm2 at a cell voltage of 2.0 V, accompanied by a superior Faradaic efficiency of 96.1%, an energy efficiency of 26%, and a low energy consumption of 26.3 kWh/kg.NH3. An oxygen vacancy-based NO3-pinned mechanism is proposed to explain our excellent nitrate reduction. Our work introduces a new paradigm to design efficient and bifunctional electrocatalysts for potential industrial-scale ammonia production.

Changes in chemical composition of TixAl1−xN coatings immersed in oxygen-saturated Lead–Bismuth Eutectic at low and moderate temperatures (250 °C ≤ T ≤ 410 °C)

Lead–Bismuth Eutectic (LBE) will serve as a liquid metal coolant in accelerator-driven systems, posing a corrosive threat to exposed materials. To address this challenge, TixAl1-xN coatings (0.38 ≤ x ≤ 0.58) were applied onto AISI 316 L austenitic stainless steel using the reactive bipolar magnetron sputtering technique. These coated samples underwent immersion in static oxygen-saturated LBE at temperatures of 250 °C and 360 °C for durations of 500 h and 1000 h, and at 410 °C for 500 h. XPS depth profiles revealed minimal oxidation at 250 °C even after 1000 h. However, at 360 °C, a mixed oxide layer of (Ti, Al)Ox was formed on the coating's surface. Exposure to LBE at 410 °C for 500 h led to the creation of an oxide bilayer comprising TiO2 (outer sublayer) and (Ti, Al)Ox depleted of Ti (inner sublayer). A model is proposed to illustrate the oxidation mechanism.

Deuterium retention in tungsten co-deposits with neon and argon inclusions

Deuterium (D) retention in tungsten (W) co-deposited layers, in the presence of neon (Ne) and argon (Ar), was investigated using the bipolar High Power Impulse Magnetron Sputtering (BP-HiPIMS) technique. The deposited layers have a polycrystalline structure, with a preferential growth of W(110) phase. The concentration of D and noble gases (Ne and Ar) is almost constant throughout the depth of the layers. In a D2-Ar discharge, the deposited layers exhibit compressive stress, indicating that Ar is mostly incorporated into the interstitial sites of the W crystal lattice. D retention increases when Ne is added in the discharge, especially when the deposited layer is bombarded with highly energetic ions. Low energy Ne ions (below the W damaging threshold) induce compressive stress, indicating that Ne atoms occupy interstitial sites in the W crystal lattice. High energy Ne ions induce tensile stress, a sign that Ne is trapped in the grain boundaries as inert-gas-vacancy defects, leading to a grain-boundary relaxation. In the presence of Ne, the ion acceleration towards the layer from 0 V to 300 V results in an increase of the D content of about three times, from 3.2 at.% to 8.6 at.%.

The Impact of Temperature and Power Variation on the Optical, Wettability, and Anti-Icing Characteristics of AZO Coatings

The structural, wettability, and optical characteristics of aluminum-doped zinc oxide (AZO) thin films were studied with the objective of understanding the impact of deposition power and deposition temperature. Thin films were deposited using a radio frequency (RF) magnetron sputtering technique. The power output of the RF was augmented from 200 to 260 W, and the temperature was increased from 50 to 200 °C, which led to the development of a (002) peak for zinc oxide. The study of film thickness was carried out using the Swanepoel envelope method from data obtained through the UV-Vis spectrum. An increase in surface roughness value was shown to be connected with fluctuations in temperature as well as increases in deposition power. The findings revealed that as deposition power and temperature increased, the value of optical transmittance decreased, ranging from 70% to 90% based on the deposition parameters within the range of wavelengths that extend from 300 to 800 nm. The wettability properties of the samples were studied, and the maximum contact angle achieved was 110°. A Peltier apparatus was utilised in order to investigate the anti-icing capabilities, which revealed that the icing process was slowed down 3.38-fold. This work extends the understanding of the hydrophobicity and anti-icing capabilities of AZO thin films, specifically increasing both attributes which provide feasible options for purposes requiring resistance to ice.

Tailoring the mechanical and high‐temperature tribological properties of Si‐DLC films by controlling the Si content

The poor high‐temperature tribological performance of diamond‐like carbon (DLC) films severely limits their applications. To address this issue, silicon (Si) doped DLC films with Si content ranging from 0 to 11.52 at.% were synthesized utilizing the plasma‐assisted reactive magnetron sputtering technique. The influence of Si incorporation on the microstructure and mechanical properties was meticulously investigated by Raman spectroscopy, scanning electron microscope (SEM), X‐ray photoelectron spectroscopy (XPS), nanoindentation, and scratch testing. To ascertain the tribological behavior of the Si‐DLC films under elevated temperature conditions, in situ high‐temperature tests were conducted, spanning temperatures from ambient to 500°C. The findings indicated that distinct lubrication mechanisms prevail for Si‐DLC films with varying Si content across different temperature domains. As the test temperature and Si content increased, the lubrication mechanism exhibited a gradual transitions from high‐temperature induced graphitization to a particle wear regime dominated by SiC and formed SiO2 abrasive phases. The comprehensive performance of the films peaked at a Si content of 4.72 at.%, suggesting an optimal composition for high‐temperature applications. It is postulated that the in‐depth investigation presented herein holds considerable value for the design and fabrication of DLC films intended for use in high‐temperature settings, potentially unlocking their full potential in such demanding environments.

Investigation on thermoelectric properties of SnSe thin films as prepared by RF magnetron sputtering

In this work, we investigated the thermoelectric properties of SnSe (Tin Selenide) thin films onto SiO2/Si-wafer substrates as prepared by RF (radio frequency) magnetron sputtering technique. The sputtering conditions used base pressure below 5.5 10-4 Pa and working pressure at 0.93 Pa within the Ar atmosphere as a flow rate fixed 40 sccm. The RF sputtering power was applied at 80 W and sputtering time for 30 min. After thin film deposition, as-deposited thin films were annealed by the vacuum annealing method at 300-450 oC. The crystal structure, morphology and film thickness, and atomic composition of SnSe thin film were carried out by X-ray diffraction (XRD), the field emission scanning electron microscope (FE-SEM), and energy-dispersive X-ray spectroscopy (EDS) techniques, respectively. The thermoelectric properties (electrical resistivity; ρ) and Seebeck coefficient; S) were measured by the ZEM-3 method to calculate the power factor (PF) value. The results showed that the as-deposited thin films had improved the crystallography of SnSe from amorphous to crystalline phases after thin films were annealed at a temperature range of 300-400 oC. At room temperature, the maximum power factor of 0.35 mW m˗1 K˗2 (ρ = 202 mΩ m and S = 165 μV K˗1) could be found to estimate the dimensionless Figure of Merit (ZT) values around 0.44 for annealing thin film sample at 400 oC.

Deposition and Optical Characterization of Sputter Deposited p-Type Delafossite CuGaO2 Thin Films Using Cu2O and Ga2O3 Targets.

CuGaO2 thin films were deposited using the RF magnetron sputtering technique using Cu2O and Ga2O3 targets. The films were deposited at room temperature onto a quartz slide. The sputtering power of Cu2O remained constant at 50 W, while the sputtering power of Ga2O3 was systematically varied from 150 W to 200 W. The films were subsequently subjected to annealing at temperatures of 850 °C and 900 °C in a nitrogen atmosphere for a duration of 5 h. XRD analysis on films deposited with a Ga2O3 sputtering power of 175 W annealed at 900 °C revealed the development of nearly single-phase delafossite CuGaO2 thin films. SEM images of films annealed at 900 °C showed an increasing trend in grain size with a change in sputtering power level. Optical studies performed on the film revealed a transmission of 84.97% and indicated a band gap of approximately 3.27 eV. The film exhibited a refractive index of 2.5 within the wavelength range of 300 to 450 nm.

Design multifunctional Mg–Zr coatings regulating Mg alloy bioabsorption

Magnesium (Mg) alloys are widely used for temporary bone implants due to their favorable biodegradability, cytocompatibility, hemocompatibility, and close mechanical properties to bone. However, rapid degradation and inadequate strength limit their applicability. To overcome this, the direct current magnetron sputtering technique is employed for surface coating in Mg-based alloys using various zirconium (Zr) content. This approach presents a promising strategy for simultaneously improving corrosion resistance, maintaining biocompatibility, and enhancing strength without compromising osseointegration. By leveraging Mg's inherent biodegradability, it has the potential to minimize the need for secondary surgeries, thereby reducing costs and resources.This paper is a systematic study aimed at understanding the corrosion mechanisms of Mg–Zr coatings, denoted Mg-xZr (x = 0–5 at.%). Zr-doped coatings exhibited columnar growth leading to denser and refined structures with increasing Zr content. XRD analysis confirmed the presence of the Mg (00.2) basal plane, shifting towards higher angles (1.15°) with 5 at.% Zr doping due to lattice parameter changes (i.e., decrease and increase of ``c” and ``a” lattice parameters, respectively). Mg–Zr coatings exhibited ``liquidphilic” behavior, while Young's modulus retained a steady value around 80 GPa across all samples. However, the hardness has significantly improved across all samples’ coating, reaching the highest value of (2.2 ± 0.3) GPa for 5 at.% Zr. Electrochemical testing in simulated body fluid (SBF) at 37 °C revealed a significant enhancement in corrosion resistance for Mg–Zr coatings containing 1.0–3.4 at.% Zr. Compared with the 5 at.% Zr coating which exhibited a corrosion rate of 32 mm/year, these coatings displayed lower corrosion rates, ranging from 1 to 12 mm/year. This synergistic enhancement in mechanical properties and corrosion resistance, achieved with 2.0–3.4 at.% Zr, suggests potential ability for reducing stress shielding and controlled degradation performance, and consequently, promising functional biodegradable materials for temporary bone implants.

Fabrication of (TiZrNbSiMo)1-xNx high entropy alloy coatings using a high power impulse magnetron sputtering technique: Effects of nitrogen addition

Due to the outstanding mechanical and physical properties of high entropy alloy (HEA) coatings, the global academic and industrial communities have made significant research efforts in recent years, aiming to expand their industrial applications. In this study, TiZrNbSiMo and (TiZrNbSiMo)1-xNx HEA nitride coatings with different nitrogen contents were fabricated using a high power impulse magnetron sputtering (HiPIMS) system. By varying the nitrogen flow rates, the nitrogen contents of coatings increased from 0 to 48.8 at. %. The deposition rate decreased with increasing nitrogen content due to the target poisoning effect. Very fine and dense microstructure can be seen for each coating. The amorphous structure was obtained as the nitrogen content was lower than 19.1 at.%, whereas a nanocrystalline FCC structure was formed when the nitrogen content reached 34.9 at. %. Furthermore, the corrosion resistance of TiZrNbSiMo and four TiZrNbSiMoN HEA coatings in 0.5 M H2SO4 aqueous solution were superior to uncoated 304 stainless steel. We can conclude that the nanocrystalline TiZrNbSiMoN HEA coatings with a nitrogen content of 34.9 at. % exhibited a high hardness of 15.6 GPa, an electrical resistivity of 766.5 μΩ·cm, and an excellent corrosion polarization resistance of 9.71 × 105 Ω·cm2, 610.7 times higher than 304SS. This study provides valuable insights for future promising applications of (TiZrNbSiMo)1-xNx HEA nitride coatings in severely corrosive environments, such as the protective coatings on stainless steel bipolar plates in proton exchange membrane fuel cells.

The effect of energy of Ar recoil particles on the interfaces and micro-structure in Ni/Ti multilayer fabricated by direct current magnetron sputtering technique

Ni/Ti multilayers have been therefore widely used in neutron optics devices because of their excellent reflective properties for neutrons, which is strongly dependent to their interfaces and microstructure. Hence, there have been many attempts to improve the interfaces and microstructure of Ni/Ti multilayers, for example reactive sputtering, interlayers and so on. In this paper, the influence of energy of Ar recoil particles on the interface and micro-structure of Ni/Ti multilayers were completed, through varying the sputtering pressure. Firstly, the Simulation present that the decreasing of sputtering pressure would enlarge the number recoil particle proportion. Secondly, three Ni/Ti multilayers were fabricated by direct current sputtering technique with variable sputtering pressures (0.080Pa, 0.120Pa, 0.199Pa). Thirdly, the grazing incidence X-ray reflectometry (GIXRR), diffusing scattering, X-Ray Diffraction (XRD), Transmission Electron Microscope (TEM) were used to characterize the interfaces and micro-structure of these films. The measured results present that their interfacial width and roughness were variable as diseasing the sputtering pressure, and the micro-structure of Ni layers transform from (111) only to both (111) and (100). These experimental results could result from the effects of energy of both Ar recoil particles and the Ni, Ti depositing atoms.

Room temperature gas sensors for NH3 detection based on SnO2 films and lamellar-structured Ti3C2Tx MXene heterojunction nanocomposites

Efficient and accurate detection of ammonia (NH3) by gas sensors at room temperature holds great practical value and significance in industrial production and environmental protection. In this work, we designed SnO2/Ti3C2Tx heterojunction nanocomposites via a facile RF magnetron sputtering technique. Benefitting from the surface porosity and few lamellar-structured of the composites, as well as the construction of heterojunctions between SnO2 and Ti3C2Tx, the SnO2/Ti3C2Tx sensor demonstrated a response of up to 13.35 % towards 50 ppm NH3 at room temperature, which was 3.5 times higher than the Ti3C2Tx-based sensor. Meanwhile, the response/recovery time was reduced to 24.9/86.5 s. In addition, the SnO2/Ti3C2Tx sensor exhibited good selectivity, repeatability, and long-term stability. This work should provide an effective strategy for the design of high-performance NH3 gas sensors at room temperature.

The effect of sputtering power on the structural and tribological behaviors at elevated temperature of Ta/Si co-doped DLC films

Ta and Si with various concentrations was co-doped into DLC films by plasma enhanced magnetron sputtering technique to improve its thermal stability and frictional performance at elevated temperature from 25 °C to 300 °C. Results showed that the doped Si and Ta mainly formed carbide in the film but play different role in the structure of the film. The sp3C content, surface roughness, hardness and adhesion strength increased firstly and then decreased with increasing content of doped elements in the film. The thermal stability and frictional performances at higher temperature was improved by higher content of doped element. It is notable that the film (with Si content of 4.47 at.% and Ta content of 2.44 at.%) exhibited low wear rates from 10−7 to 1 × 10−6 mm3/Nm at different temperatures owing to its higher sp3C content (18.2 %), proper nano-carbide, and thus higher hardness (11.09 GPa) and lower internal stress (0.24 GPa). The excellent frictional performances of this film tested at 300 °C was due to the reduced graphitization of the film, accompanied with the SiC nanoparticles and Ta5Si3 phase formed during the friction.

Effect of Deposition Working Power on Physical Properties of RF-Sputtered CdTe Thin Films for Photovoltaic Applications.

The main objective of this study was to determine the variation in the properties of cadmium telluride (CdTe) thin films deposited on a p-type Si substrate by the radio frequency magnetron sputtering technique at four different working powers (70 W, 80 W, 90 W, and 100 W). The substrate temperature, working pressure, and deposition time during the deposition process were kept constant at 220 °C, 0.46 Pa, and 30 min, respectively. To study the structural, morphological, and optical properties of the CdTe films grown under the mentioned experimental conditions, X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and optical spectroscopy were used. For a better analysis of the films' structural and optical properties, a group of films were deposited onto optical glass substrates under similar deposition conditions. The electrical characterisation of Ag/CdTe/Al "sandwich" structures was also performed using current-voltage characteristics in the dark at different temperatures. The electrical measurements allowed the identification of charge transport mechanisms through the structure. New relevant information released by the present study points towards 90 W RF power as the optimum for obtaining a high crystallinity of ~1 μm nanostructured thin films deposited onto p-Si and optical glass substrates with optical and electrical properties that are suitable for use as absorber layers. The obtained high-quality CdTe nanostructured thin films are perfectly suitable for use as absorbers in CdTe thin-film photovoltaic cells.

Transmission electron microscopy reveals clusters of Au–Ag nanoparticles formed in TiO2 thin film, with enhanced plasmonic response

This work reports on the influence of nanoparticle (NP) size distribution and the chemical nature of gold (Au) and/or silver (Ag) NPs in the localized surface plasmon resonance (LSPR) responses. The NPs were produced embedded in a titanium dioxide (TiO2) thin film, deposited by reactive magnetron sputtering technique followed by in-vacuum thermal treatment at 400 °C. High-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) gave quantitative key information in terms of both the size and distribution of the noble metal NPs. The average Feret diameter was 17 nm (σ = 8) and 55 nm (σ = 28) for Au/TiO2 and Ag/TiO2 films, respectively, while the Au–Ag/TiO2 film showed intermediate values, with an average size of 22 nm (σ = 9). HAAD-STEM, complemented by EDX chemical mapping, revealed an unusual formation of cluster structures containing local distributions of bimetallic (alloyed) Au–Ag NPs. The synergetic characteristics and properties of such bimetallic Au–Ag NPs resulted in an outstanding LSPR sensitivity compared to the monometallic counterparts. Furthermore, the analysis of the average nearest neighbor distances (about one order of magnitude lower than counterparts) suggests the existence of plasmonic hotspots relevant to be explored in sensing and surface-enhanced spectroscopies.

Optimization of the plasmonic properties of titanium nitride films sputtered at room temperature through microstructure and thickness control

A current approach to depositing highly plasmonic titanium nitride films using the magnetron sputtering technique assumes that the process is performed at temperatures high enough to ensure the atoms have sufficient diffusivities to form dense and highly crystalline films. In this work, we demonstrate that the plasmonic properties of TiN films can be efficiently tuned even without intentional substrate heating by influencing the details of the deposition process and entailed films’ stoichiometry and microstructure. We also discuss the dependence of the deposition time/films’ thickness on the optical properties, which is another degree of freedom in controlling the optical response of the refractory metal nitride films. The proposed strategy allows for robust and cost-effective production of large-scale substrates with good plasmonic properties in a CMOS technology-compatible process that can be further processed, e.g., structurized. All reported films are characterized by the maximal values of the plasmonic Figure of Merit (FoM = − ε1/ε2) ranging from 0.8 to 2.6, and the sample with the best plasmonic properties is characterized by FoM at 700 nm and 1550 nm that is equal 2.1 in both cases. These are outstanding results, considering the films’ polycrystallinity and deposition at room temperature onto a non-matched substrate.

High-performance broadband SnS photodetector based on photoconductive-bolometric coupling effect

Due to its large absorption coefficient and high carrier mobility, SnS exhibits strong promise in the area of optoelectronic devices. Nevertheless, the fabrication of large-area, high-quality films for SnS photodetectors (PDs) with superior photoresponse remains a formidable task, seriously limiting its further practical application. In the present study, we report a superior-performance broadband PD founded on the epitaxial SnS film. Large-area uniform SnS films were grown epitaxially on (100)-oriented KBr using magnetron sputtering technique, further exfoliated, and transferred in a wafer size to fabricated two-ends PD devices. Benefitting from high crystallization and unique photoconductive-bolometric coupling effect, the two modes of operation exhibit a wide range of spectral responses from the visible to near-infrared wavelength (405–1920 nm). Particularly noteworthy is the SnS device fabricated, which demonstrates an impressive responsivity of 95.5 A W−1 and a detectivity of 7.8 × 1011 Jones, outperforming other devices by 1–2 orders of magnitude. In addition, SnS PD shows excellent environmental durability. This work provides a robust approach to develop high-performance broadband SnS PDs, while simultaneously offering deep insight into the light–matter interactions.

Post-annealing in ultra-high vacuum or nitrogen plasma for MoS2 thin films deposited by magnetron sputtering

The thin films of amorphous molybdenum disulfide were deposited at room temperature by magnetron sputtering technique. Post-annealing process in ultra-high vacuum (∼10−8 Pa) or nitrogen plasma environments at the temperatures of 300, 400, 500, and 700 °C have been first proposed to enhance the microstructure and optical properties of MoS2 thin films. The phase transformation of MoS2 thin films from amorphous to polycrystalline was characterized by in situ reflection high-energy electron diffraction during the post-annealing process. The microstructure of MoS2 thin films was also analyzed by Raman spectrum and X-ray diffractometer after the post-annealing process. In addition, the thermal analysis of the differential scanning calorimeter and optical measurement of photoreflectance confirmed the phase transformation of MoS2 thin films. The analysis of photoreflectance also estimated the exciton transition at the bandgap energy of 2.038 eV at 0 K, attributed by the crystalline MoS2 film annealed at 700 °C in ultra-high vacuum. The surface chemical composition of MoS2 thin films has been identified by X-ray photoelectron spectroscopy, but the desulfurization of MoS2 was observed after post-annealing in ultra-high vacuum. Moreover, the preferred orientation of (004) plane in the MoS2 films was performed as the increase in post-annealing temperature.